Magnetron Sputtering Equipment

Magnetron Sputtering Equipment

Details
Magnetron sputtering is a physical vapor deposition technology that uses a magnetic field to confine and enhance glow discharge plasma, thereby efficiently sputtering target materials and depositing thin films on substrates.
Condition: New
Warranty: 1 Year
After-sales Service Provided: Field installation, commissioning and training, Engineers available to service machinery overseas
Certification: CE, ISO9001
Substrate: Plastic, metal, glass, ceramic, stainless steel, etc.
Vacuum chamber material: SUS-304 superior stainless steel
Vacuum chamber size: Custom-made
Vacuum chamber structure: Vertical/Horizontal/Batch/In-line
Deposition material: Titanium/Aluminum/Chrome/Copper/TiAl/TiN/SS,etc.
Coating film function: Decorative,super hard, wear-resistant, anti-corrosion, reflective, shielding effect, conduction,non-conduction, etc.
Coating color: Gold, Rose gold, silver, black, blue, coffee, rainbow, purple, etc.
Category
Vacuum Coating Machine
 
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Description
Technical Parameters

Operational principle:

 

Magnetron sputtering is a physical vapor deposition technology that uses a magnetic field to confine and enhance glow discharge plasma, thereby efficiently sputtering target materials and depositing thin films on substrates.

 

Applications:

 

It is widely used in household appliances, clocks, golf heads, arts and crafts, toys, car light reflectors, mobile phone button shells, instruments and meters, plastics, glass, ceramics, tiles and other surface decorative coatings and functional coatings for tools and molds.

It has advantages in the fields of plating ultra-black film, pure gold decorative film, etc.

 

 

Features:

 

The film thickness is controllable and repeatable.

It can reliably deposit a film of predetermined thickness, and sputtering coating can obtain a uniform film thickness on a large surface.

 

The film has strong adhesion to the substrate.

Some high-energy sputtered atoms produce different degrees of injection, forming a pseudo-diffusion layer on the substrate where the sputtered atoms and substrate atoms fuse with each other.

 

Preparation of thin films of special materials.

Mixed films and compound films can be prepared by sputtering different materials at the same time. TiN imitation gold films can also be sputtered.

 

The film has high purity and the sputtered film will not be mixed with the components of the crucible heater material.

 

Equipped with low-temperature ion auxiliary source, it can form films by cold plating at room temperature without heating, saving energy and electricity, and improving production capacity.

 

Specification:

 

Magnetron sputtering equipment

Model

CJ-600

CJ-800

CJ-1000

CJ-1200

CJ-1400

CJ-1500

CJ-1600

Chamber size

Φ600×800MM

Φ800×1000MM

Φ1000×1200MM

Φ1200×1400MM

Φ1400×1600MM

Φ1500×1500MM

Φ1600×1800MM

Vacuum unit

KT400 Diffusion pump unit

KT500 Diffusion pump unit

KT800 Diffusion pump unit

KT630 Diffusion pump unit

Double KT630 Diffusion pump unit

Double KT630 Diffusion pump unit

Double KT630 Diffusion pump unit

Coating system

DC or medium frequency power supply, coating auxiliary ion special power supply

Inflation system

Mass flow meter

Control method

Manual or fully automatic

Ultimate vacuum

5X10-3Pa

Remark

The above equipment parameters are for reference only, and are designed and customized according to the actual process requirements of customers.

 

 

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