Operational principle：
Magnetron sputtering is a widely used physical vapor deposition technology. Its core advantage lies in its ability to deposit uniform, dense, and highly adhesive thin films at high speed at relatively low temperatures, and its wide range of target material selection (metals, alloys, ceramics, polymers, etc.).
Applications:
Semiconductors and microelectronics
Optical coating
Flat panel display
Decorative coating
Super hard wear-resistant coating for tools and molds
Features:
High deposition rate
Low temperature deposition
Good film quality
Material universality
Low working air pressure
Good process control ability
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