Operational principle:
Inside a vacuum chamber, a magnetic field is used to confine a glow discharge, causing argon ions to bombard the target material at high speeds,target atoms are sputtered off and deposited onto the workpiece surface to form a dense thin film-a process classified as Physical Vapor Deposition (PVD).
Equipment Features
Compatible with various types of sputtering targets
Supports DC, MF, and RF magnetron sputtering targets, accommodates both metal and oxide ceramic targets, enabling the deposition of both metallic and insulating dielectric films.
Substrate Revolution and Rotation Mechanism
The workpiece rack utilizes a planetary rotation system, enabling the workpieces inside the furnace to simultaneously revolve and rotate, this ensures excellent film thickness uniformity across the entire furnace load and minimizes color variation.
Low-Temperature Ion Pre-treatment System
Equipped with a built-in ion cleaning source, the system bombards the workpiece surface with plasma prior to coating to remove oil contaminants and oxide layers. It enables low-temperature film deposition with minimal substrate heating, making it suitable for processing heat-sensitive plastics such as ABS and PC without causing burning or deformation.
Independent vacuum unit configuration
Combination of a turbomolecular pump, a Roots pump, and a rotary vane pump, ensuring a stable pumping curve.
Fully automatic PLC industrial control system
Process automation, process recipes can be stored and recalled with one click.
Precision Gas Flow Control
Utilizes multiple Mass Flow Controllers (MFCs) to precisely regulate reactive gases such as argon, oxygen, and nitrogen, making it suitable for the reactive sputtering deposition of oxide and nitride composite films.
Safety Interlock Protection
Includes interlocks for the chamber door and vacuum system, as well as protections against overload, water shortage, and power failure, automatic shutdown upon detecting anomalies to protect the target source and vacuum system.
Applications:
Decorative Coating
Watch cases, bathroom hardware, golf club heads, handicrafts, toys, automotive headlight reflectors, and mobile phone or home appliance housings and buttons. Capable of producing imitation gold, gunmetal black, ultra-black, and colored decorative coatings, serves as an eco-friendly, pollution-free alternative to traditional water-based electroplating.
Compatible Substrates: ABS plastic, glass, ceramics, tiles, and various metals.
Functional Films
Mold and Tooling: Wear-resistant protective coatings for cutting tools and molds/dies














Advantages
The film thickness is controllable and repeatable.
It can reliably deposit a film of predetermined thickness, and sputtering coating can obtain a uniform film thickness on a large surface.
The film has strong adhesion to the substrate.
Some high-energy sputtered atoms produce different degrees of injection, forming a pseudo-diffusion layer on the substrate where the sputtered atoms and substrate atoms fuse with each other.
Preparation of thin films of special materials.
Mixed films and compound films can be prepared by sputtering different materials at the same time. TiN imitation gold films can also be sputtered.
The film has high purity and the sputtered film will not be mixed with the components of the crucible heater material.
Equipped with low-temperature ion auxiliary source, it can form films by cold plating at room temperature without heating, saving energy and electricity, and improving production capacity.
Specification:
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Magnetron sputtering coating machine |
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Model |
CJ-600 |
CJ-800 |
CJ-1000 |
CJ-1200 |
CJ-1400 |
CJ-1500 |
CJ-1600 |
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Chamber size |
Φ600×800MM |
Φ800×1000MM |
Φ1000×1200MM |
Φ1200×1400MM |
Φ1400×1600MM |
Φ1500×1500MM |
Φ1600×1800MM |
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Vacuum unit |
KT400 Diffusion pump unit |
KT500 Diffusion pump unit |
KT800 Diffusion pump unit |
KT630 Diffusion pump unit |
Double KT630 Diffusion pump unit |
Double KT630 Diffusion pump unit |
Double KT630 Diffusion pump unit |
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Coating system |
DC or medium frequency power supply, coating auxiliary ion special power supply |
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Inflation system |
Mass flow meter |
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Control method |
Manual or fully automatic |
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Ultimate vacuum |
5X10-3Pa |
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Remark |
The above equipment parameters are for reference only, and are designed and customized according to the actual process requirements of customers. |
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