Ceramic substrate PVD coating machine is a key equipment for high-precision thin film deposition of ceramic materials (such as aluminum oxide, aluminum nitride, silicon nitride, zirconium oxide, etc.).
It uses physical vapor deposition technology under vacuum environment to form various functional films on the surface of ceramic substrates.
Ceramic substrate PVD coating machines have become an indispensable core equipment for realizing surface functionalization of ceramic substrates (conductive, thermal, solderable, bonding, protective, optical, etc.) in high-end electronics, optoelectronics, semiconductors, power electronics and other fields due to their ultra-high vacuum environment, precise process control, multiple coating technology options and excellent thin film properties (high purity, density, strong adhesion, high precision).
Applications:
Electronic packaging
Metallization on LED chip holders, power module substrates, microwave RF device housings/substrates, and semiconductor ceramic packages.
Optoelectronics
Metallization of ceramic substrates/heat sinks for LEDs, lasers, and photodetectors.
Semiconductors
Interconnections on MEMS device structural layers, sensor electrodes, and ceramic insulation layers.
Power electronics
Surface metallization (Cu, Al) and barrier/protective layers of ceramic substrates (DCB, AMB) for power devices such as IGBT and MOSFET.
Thin film circuits
Thin film resistors, capacitors, inductors, and transmission lines on ceramic substrates for hybrid integrated circuits and microwave millimeter wave circuits.
Sensors
Functional electrodes and leads for various ceramic substrate sensors (pressure, temperature, gas).
Aerospace and defense
High reliability, extreme environment resistant electronic components and ceramic parts.



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