Magnetron sputtering equipment is mainly composed of the following parts:
1. Target material: the core component of magnetron sputtering equipment, usually made of metal, alloy and other materials.
2. Vacuum chamber: the operating environment of magnetron sputtering equipment needs to be carried out under high vacuum conditions, and the vacuum chamber plays the role of maintaining vacuum.
3. Magnetron system: the magnetic field is used to control the ion bombardment on the surface of the target material to cause sputtering.
4. Substrate frame: used to support the substrate material to be processed.
5. Heating system: in some cases, the target material and substrate need to be heated to control the sputtering process.
